High-Breakdown P-Channel GaN MOS-HFETs with Al2O3-Dielectric and Drain Field-Plate

نویسندگان

چکیده

This work reports record-high three-terminal on-state drain-source breakdown voltage (BVDS) of -735 V in p-channel GaN metal-oxide-semiconductor heterostructure field-effect transistors (MOS-HFETs) with a drain field-plate (DFP). High-k and wide-gap Al2O3 was deposited as the gate oxide surface passivation by using non-vacuum ultrasonic spray pyrolysis deposition (USPD) technique. Good source/drain ohmic contacts were obtained devising an Mg-doped p++-GaN capper. Enhanced two-dimension hole gas (2DHG) characteristics current densities have also been achieved devised p-GaN/GaN/AlN/Al0.3Ga0.7N heterostructure. The present MOS-HFET design (without) DFP has demonstrated superior on/off ratio (Ion/Ioff) 2 × 106 (9.2 105), maximum density (IDS, max) -9.5 (-10.6) mA/mm at VDS = 20 V, two-terminal off-state gate-drain (BVGD) 710 (520) BVDS (-545) respectively. is suitable for applications high-voltage complementary power-switching circuits electric vehicle (EV) electronics.

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ژورنال

عنوان ژورنال: IEEE Journal of the Electron Devices Society

سال: 2023

ISSN: ['2168-6734']

DOI: https://doi.org/10.1109/jeds.2023.3294911